MS Physics Thesis Defense: “Oblique angle deposition of Copper films on elastomeric gratings” by Artoni Ang

Oblique angle deposition of Copper films on elastomeric gratings

Name: Artoni Ang
Degree Program: M.S. in Physics
Thesis Defense Date: Thursday, 21 February 2013
Time: 6:00 pm
Venue: Faura 318
Adviser: Mr. Ivan Culaba
Department: Physics
School: School of Science and Engineering


Oblique angle deposition (OAD) has been used by several studies to change the property of the film by altering its nanostructure. In this study, oblique angle deposition was employed to reduce the buckling that result from the film deposition process. The surfaces of the films were observed before and during the application of stress. Prior to the application of stress, the samples deposited using conventional deposition exhibited buckles on their surface. The samples produced using OAD, on the other hand, did not exhibit any buckling. Upon the application of strain however, all samples eventually developed buckles that form perpendicular to the direction of the applied tensile stress. These buckles result in the decrease of the enhancement factor of the samples. The application of stress also resulted in the elongation of the diffraction grating. This increases the grating pitch of the samples and decreases the diffraction angle. However, in one of the samples produced, a columnar microstructure was observed on the film. The surface of this sample showed minimal buckling during the application of tensile strain, which caused a minimal decrease in the enhancement factor of this sample.


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